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HIGH TEMPERATURE MOCVD SYSTEM
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產品目錄
Semiconductor (46)
FAB (34)
Ion Implanter (1)
Coater (2)
Developer (1)
Asher (2)
UV Cure (1)
Deposition (1)
PECVD (3)
Etcher (3)
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Spin Dry (2)
Grinder (1)
Saw (1)
Wafer Clean (1)
Prober (1)
Oven (3)
Others (2)
Measure (6)
Stepper (12)
i7A (7)
i7B (2)
i10D (1)
PAS 5500/100D (1)
SS300 (1)
LED (139)
FAB (93)
MOCVD (10)
MO-Source (2)
Photo (10)
Etch (12)
Deposition (9)
Furnace (24)
Spin Dry (0)
Measure (10)
Grind (2)
Saw (3)
Sorter (8)
Other (0)
Polishing (2)
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PKG (46)
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Measure (11)
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TEMPLATE (1)
AlN (1)
FACILITY (66)
Gas System (32)
Gas Cabinet (7)
Gas Purifier (14)
VMB (3)
Wafer carrier (6)
GAS Analyzer (2)
Scrubber (34)
EDWARD (31)
NEWTECHWAVE (3)
Burn wet type (6)
Heat wet type (4)
Heat Cooling type (9)
新進設備
ENi-200U High Temperature MOCVD System
FulinTech Sputter FU-16PSB
AIXTRON MOCVD CRIUS II
Top Engineering STX300A
SVS MSX2000 Coater
Yamato Scientific DN-42
Wonik FA-2000II-FV-H1-K-2 NH3 VMB
WONIK Si2H6 Gas Cabinet
K.C.Tech Si2H6 Gas Cabinet
TERATECH TPAM-CA-040N-SEU2M NH3 Gas Purifier
TERATECH TPN-CAM-200N-SEU3M N2 Gas Purifier
TERATECH TPH-CAG-200N H2 Gas Purifier
SPIN DRY
K.C.Tech O2 Gas Cabinet
WONIK Si2H6 VMB
TERATECH TPAM-CA-040N NH3 Gas Purifier
OSUNG ST Chamber
ThermoNik Baking Furance THBF-6060G (+Edwards Pump)
UltraTech SS300
AlN
Samco PECVD PD4800
ETAMAX PL MAPPING
AIXTRON MOCVD 2800 G5HT
Maxis 300LAH
Sentech SE500
Panasonic E620 SiO2 Etcher
SVS MSX1000 Coater
Panasonic E620
ASM MS100
Top Engineering STX300A
Tainics TE3100
設備查詢
Maker :
Model :
Wafer Size :
Wafer Size
18
2
2,3,4,5,6
2,4
3
3,4,5
3,4,5,6
3,4,5,6,8
4
4,5
4,5,6
4,5,6,8
4,6
5
5,6
5,6,8
6
6,8
6,8,12
8
8,12
12
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